Process Engineering Intern

The intern will analyze leakage mechanisms in flowable low-k SiOCH films using I–V measurements and structural analysis (FTIR/XPS). The project focuses on correlating material structure with leakage behavior, using only generalized or literature-based conditions to ensure compliance with ASM’s IP protection policy.

The intern will work with dummy samples simulating typical low-k films (SiOCH-based). They will perform I–V/C-V testing to identify leakage models (e.g., Poole-Frenkel, tunneling) and use FTIR/XPS to evaluate bonding states and composition. The experimental design would use a two-factor DOE (e.g., temperature × cure time). Data analysis will focus on model fitting and correlation between structural and electrical properties. All deliverables will be reviewed and masked to avoid IP-sensitive content.

• A student with a background in Materials Science, Chemical Engineering, Applied Physics, or a related field. Experience with electrical measurements or materials characterization is preferred. Master’s or PhD’s level students are eligible.

Top 3 Skillsets:

1. Electrical measurement (I–V testing)
2. Materials analysis (FTIR, XPS)
3. Data analysis and problem-solving

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ASM is an equal opportunity employer and considers qualified applicants for employment without regard to race, color, religion, age, nationality, social or ethnic origin, sexual orientation, gender, gender identify or expression, marital status, pregnancy, political affiliation, disability, genetic information, veteran status, or any other characteristic protected by law.